Vacuum Deposition System for E-Beam Evaporation and RF Sputtering
Abstract
The equipment will provide the critical capability of thin film deposition of a wide variety of materials including metals, dielectrics, semiconductors and magnetic materials. Any solid state evice requires the ability to deposit high quality thin films. The proposed equipment allows two complementary deposition techniques- e-beam evaporation and sputtering. The tool will allow a wide coverage of deposition parameters including deposition rate, conformity-directionality, film density, and composition. It will be one of the most versatile tools in the fabrication facility where it will be installed.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Feb 29, 2024
- Source ID
- FA95502310265
Entities
People
- Wounjhang Park
Organizations
- Air Force Office of Scientific Research
- Regents of the University of Colorado
- United States Air Force