DNA-based Nanofabrication of Functional Nanoscale Devices
Abstract
ABSTRACT Research objective: The objective of this project is to develop a toolkit to enable DNA-based multi-step nanofabrication of functional semiconductor nanoelectronic devices. The research will address two major challenges that are central to the practical application of DNA-based nanomanufacturing: (1) programmable, self-aligned deposition of DNA templates for multi-step nanofabrication; and (2) site-specific doping of Si and other inorganic semiconductor substrate using DNA template. Significance: Although DNA-based nanofabrication has been under development for almost two decades, they are still far away from being a practical tool to compete with existing lithography techniques. A close examination suggests that DNA-based template is not ideally suited for the current nanofabrication model. Specifically, existing nanofabrication processes heavily rely on multi-step nanofabrication, during which the subsequent lithography must be aligned with previous patterns. Such multi-step process is extremely challenging for DNA-based nanofabrication due to the difficulty to align DNA template with existing patterns. On the other hand, many of the unique properties of DNA nanofabrication have not been fully exploited to optimize the nanomanufacturing process. This research proposed will address both issues by developing the necessary chemistry and engineering tools. If successful, these efforts will pave the way to a new lithography model that will fully utilize the unique features of DNA template for multi-step nanofabrication. As a proof of concept, we will demonstrate the fabrication of functional silicon devices using the only DNA-based nanofabrication. This research is potentially transformative because it will address two key challenges in realizing multi-step nanofabrication using DNA templates. If successful, it will allow DNA nanostructures to be used as a general-purpose template for the fabrication of semiconductor nanoelectronic devices; in some niche areas (e.g., low volume nanomanufacturing), this DNAbased nanofabrication may offer a competitive low cost alternative to the traditional photolithography process. Naval Relevance. This research will make a major step forward in the development of a DNA-based bottom-up nanolithography that is both low cost and high resolution. This lithography is compatible with a wide range of inorganic substrates (e.g., Si) and therefore will enable the low-cost production of nanoelectronic and optoelectronic components. These devices are critical to reducing weight load and enhancing survival of Marines and SEALs. Unlike traditional nanofabrication, DNA based lithography will not require the fabrication of expensive masks and is therefore suitable for nanofabrication at extremely low volume.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Aug 12, 2016
- Source ID
- N000141512520
Entities
People
- Haitao Liu
Organizations
- Office of Naval Research
- United States Navy
- University of Pittsburgh