PolyAlicyclics by Rational Design as Dielectrics for Extreme Electrification

Abstract

High energy density capacitors are necessary for Naval power, especially as it pertains to electromagnetic aircraft launch systems,and potentially electric vehicles. Our past research has yielded a paradigm shift in the use of high temperature polymers for dielectric capacitors, and for proper development, polymers need to be melt processed to be adequately scaled to meet price demands. The goal here is to produce new melt processable polymers with high band gap (>5eV), high dielectric constant (>3.5) and have a Tg exceeding operational temperature of 150 degrees C. Polyimides have been calculated using the polymer genome developed through previous ONR MURI funding using a matrix of 10 diamines and 13 dianhydrides, most of which are commercially available monomers, to give 16 proposed alicyclic polyimides from commercially available dianhydrides and diamines with bandgaps above 5eV, and glass transition temperatures ranging from 153 degrees C to 278 degrees C. These 16 new polyimides will be prepared, purified and characterized and solution processed into films and will be tested across a broad temperature range to understand their dielectric breakdown. All dielectric and mechanical properties measured for these films will be used to update and further train the polymer genome. In addition to Tg, Tm will be measured and, in collaboration with R. Ramprasad, a correlation between mechanical properties and prediction of melt processability will be attempted. Should correlation exist, accurate predictions for melt processable, high temperature operationpolymer dielectrics will be made feasible. Approved for Public Release

Document Details

Document Type
DoD Grant Award
Publication Date
Mar 03, 2023
Source ID
N000142312292

Entities

People

  • Gregory Sotzing

Organizations

  • Office of Naval Research
  • United States Navy
  • University of Connecticut

Tags

Readers

  • Polymer Science and Engineering.
  • Polymer Science and Technology