NICOP - Ion bean assisted deposition of Gallium oxide based films for high power device applications

Abstract

The objective of this work is to understand growth of high quality semi-insulating and doped Ga2O3 films by ion beam assisted deposition (IBAD). Research focus on the IBAD growth of high quality ?- and ?- phase Ga2O3 and related group III-oxide alloys thin films on various substrates such as ?-Ga2O3, SiC, sapphire, GaN, and AlN. The viability of these homo- and heterostructures of Ga2O3 and related group III-oxide alloys as a next generation high power and RF semiconductor materials for future navy needs will be determined.

Document Details

Document Type
DoD Grant Award
Publication Date
Sep 04, 2018
Source ID
N629091812121

Entities

People

  • Fernando Chubaci

Organizations

  • Office of Naval Research
  • United States Navy
  • University of São Paulo

Tags

Fields of Study

  • Materials science

Readers

  • Government Contracting/Procurement.
  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene