Trusted Mask Trust Approach

Abstract

This project develops a new secure (SECRET-level) photomask manufacturing capability down to 14 nanometer (nm) at an existing leading-edge commercial photomask manufacturing supplier to secure the masks and design Internet Protocol (IP) of acquisition programs. This capability can be used in conjunction with one or more leading-edge untrusted commercial foundries. This capability will address needs for trusted masks at technology node sizes < 130nm.

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Document Details

Document Type
Project
Publication Date
Oct 01, 2017
Source ID
P837_0605140D8Z_5_0400_PB_2017

Tags

Fields of Study

  • Physics

Readers

  • Cybersecurity.
  • Defense Technology Research and Development.
  • Nanofabrication and Microfabrication.

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