Near-UV Gan VCSELs Enabled by Nanoporous Optical Engineering

Abstract

In response to the need of chip-scale atomic clocks based on Yb ions, we propose the development of a compact GaN-based vertical cavity surface-emitting laser (VCSEL) that will emit at 369.1nm with hop-free mode stability and a narrow spectral linewidth. At present the pumping of a Yb-ion transition in an atomic clock is enabled with a frequency-doubled, external-cavity laser that cannot be easily miniaturized. The wavelength of commercial solid-state diode laser is unfortunately limited to above 370 nm; these diode lasers are of the type of edge-emitting laser with a high power consumption (~0.5 W), multiple longitudinal modes, and a narrow free spectral range (FSR, .f < 70 GHz), consequently unsuitable as an effective source for pumping atomic transitions. The goal of this proposal is to develop a compact, low power, coherent, and single mode light source operated in the near-ultraviolet (~369 nm) spectral range. Such a compact and single mode source has not been realized but is expected to have broad applications in information processing, micro-display and projection, high-resolution printing, biophotonics, spectroscopic probing, and atomic optics, to name just a few. Vertical cavity surface emitting laser (VCSEL) is the most promising candidate for such a coherent light source. Wide bandgap AlGaInN semiconductor family has a direct bandgap that suitably covers this wavelength. In spite of a few reports of InGaN VCSELs in the blue and green, the processes of fabricating these microcavities have been exceedingly complicated, causing a severe downgrade in device performance (relative to other commercial III-nitride emitters). Furthermore, the processes described do not offer sufficient controllability and reproducibility. The purpose of this proposal is to investigate a new process in fabricating InGaN VCSELs using a special nanoporous GaN (NP-GaN) capable of circumventing these daunting challenges. Using such a NP-GaN, we have new freedom in optical engineering of microcavity design without the complex constraints in epitaxy or fabrication. More importantly, the NP GaN-based reflector will give the III-nitride material system, for the first time, a design option of a conductive mirror to support vertical current injection that is crucially vital in attaining high performance VCSELs.

Document Details

Document Type
DoD Grant Award
Publication Date
Jan 12, 2017
Source ID
W911NF1510378

Entities

People

  • Jung Han

Organizations

  • Army Contracting Command
  • Office of the Secretary of Defense
  • Yale University

Tags

Fields of Study

  • Materials science

Readers

  • Integrated Circuit Design and Technology.
  • Optical Physics and Photonics.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Microelectronics