Structural and electrical properties of metastable oxide phases created under extreme oxygen pressures

Abstract

The technical objective of this proposal is to investigate physical properties of new metastable oxide phases formed by interdiffusion and reaction at oxide interfaces in extremely reducing environments as well as high pressure environments, i.e. spanning over 25 decades in oxygen pressure. The PI proposes to use a custom built furnace system to conduct the high temperature, varying pressure studies. The classes of oxide systems that will be studied include fluorite-silica heterostructures with cations of different ionic radii doped in the fluorite lattice and the other is heterostructures of nickel oxide-silica with varying bilayer periods. In-situ Electrical measurements as a function of oxygen pressure in the furnace will be taken to identify phase formations and stability. The PI will study relationships between microstructure and defects to electronic, ionic and dielectric properties of these materials.

Document Details

Document Type
DoD Grant Award
Publication Date
Jan 12, 2017
Source ID
W911NF1610042

Entities

People

  • Shriram Ramanathan

Organizations

  • Army Contracting Command
  • United States Army
  • University of Virginia

Tags

Fields of Study

  • Materials science

Readers

  • Research Science/Academic Research
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene