Instrumentation up-fit for reactive nanolaminate PVD

Abstract

PI Maria conducted an instrument upfit for physical vapor deposition (PVD) systems that combines electron beam (e-beam) evaporation with magnetron sputtering and pulsed laser deposition. The original instrumentation was supported by a 2014 DURIP award to enable clean, uniform, and rapid deposition of a wide variety of metallic, semiconducting, and ceramic thin films that serve multiple current and pending DoD programs at NCSU. While this instrumentation benefits several programs, its primary role is to support nanoenergetic materials research and the new NCSU-led MURI: Multi-modal Energy Flow at Atomically Engineered Interfaces.

Document Details

Document Type
DoD Grant Award
Publication Date
Jan 30, 2017
Source ID
W911NF1610077

Entities

People

  • Jon-Paul Maria

Organizations

  • Army Contracting Command
  • North Carolina State University
  • United States Army

Tags

Fields of Study

  • Physics

Readers

  • Research Science/Academic Research
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene