Acquisition of an Advanced Atomic Layer Deposition System for Research at Nanoscale for Energy Harvesting and Nanoelectronics at Alabama A&M University
Abstract
In the 21st century, nanostructures and devices are increasingly important in providing new applications for medical, biotechnical, nanoelectronic, photonic, and other industries. The objective of this proposal is to acquire a state-of-the-art KJLC 150-LX atomic layer deposition (ALD) system to enable researchers at the Alabama A&M University (AAMU), a leading HBCU, to fabricate devices at the micro- and nanoscales. The capability of fabricating materials and devices at nanoscale is critical not only for the advancement of science and technology, but also for the training of the future scientific workforce. Currently, 10 engineering and science faculty members and more than 30 graduate and undergraduate students rely on the Class 1,000 Clean Room as a primary experimental resource for the design and fabrication of nanoscale materials and devices. Two of the key capabilities for nanoscale fabrication are the ability to create patterns using UV or e-beam lithography, and the ability to grow nanoscale thin-film materials. Our lithographic capability is excellent: (1) a JEOL scanning electron microscope with nanometer pattern generation system for e-beam lithography was acquired with DoD support for our clean room four years ago; (2) A Suss MABA 6 Gen3 mask aligner for UV lithography is being acquired with the DoD/ARO support and will be installed in the clean room in early 2017. Our PVD thin-film deposition capability is also excellent: we have both sputtering deposition system and thermal/e-beam evaporation system for physical vapor deposition (PVD) of thin-film materials. However, we donÕt have any chemical vapor deposition (CVD) system in our clean room. CVD has advantage over PVD such as having higher film quality and better film conformity, which are critical in the fabrication at nanoscales. The requested atomic layer deposition system is necessary companion instruments to our 2,500 sq. ft class 1,000 clean-room fabrication tools. Through this proposal evidence is provided that acquisition of the ALD system would propel nanoscale science and technology at AAMU to new frontiers. This requested system will enable AAMU to better serve northern Alabama and its surrounding communities. Impact on Research: Multiple research projects at AAMU require an advanced atomic layer deposition capability. The research areas range from fabrication of energy-conversion materials and devices to nanoelectronic devices. The acquisition of the advanced ALD system will make these projects to be completed successfully, and will serve multiple faculty and student users. The research accomplishments will greatly benefit DoD and also the research community. Impact on Education: Acquisition of this system will not only aid in advancing multiple research areas, many with applications that directly benefit society, but will also enhance educational opportunities for both graduate and undergraduate students. The use of state-of-the-art instruments provides essential training to our majority underrepresented student population who will become tomorrowÕs researchers in government, academia, and industry. Undergraduates will be exposed to the exciting and rich possibilities of nanofabrication through the research projects. High school teachers and students will be trained on the instrument. About 90% of the students trained with this instrument will be minority students.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Sep 20, 2018
- Source ID
- W911NF1710474
Entities
People
- Zhigang Xiao
Organizations
- Alabama A & M College
- Army Contracting Command
- Office of the Secretary of Defense