High-Resolution X-Ray Diffractometer for Advanced Epitaxial Thin-Film and Nanoscale Materials Characterization
Abstract
The Center for High Technology Materials (CHTM) at the University of New Mexico proposes the acquisition of a state-of-the-art high-resolution X-ray diffractometer to support Department of Defense (DoD) research related to advanced epitaxial thin-film and nanoscale materials growth and characterization. CHTM is a nationally recognized leader in epitaxial growth of compound semiconductors, including novel nanoscale materials, short-period superlattices, and conventional electronic and optoelectronic devices. CHTM boasts one of the few facilities in the nation with both metal-organic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE) capabilities and has one of the largest clusters of MBEs dedicated to arsenide and antimonide growth. CHTM has previously had and continues to have key projects funded by the DoD. A key deficiency in properly supporting DoD projects is the lack of a state-of-the-art, highresolution X-ray diffractometer, which is critically needed to analyze and optimize advanced epitaxial growth structures. The proposed system will provide a wealth of conventional structural information related to the strain state, alloy composition, layer thickness, density, layer tilt and distortion, interfacial roughness, and defect density/distribution of materials. In addition, the new system will provide novel capabilities that are specifically targeted to advanced epitaxial thinfilm and nanoscale materials characterization that are not available elsewhere at UNM, including high-resolution triple-axis scanning, ultra-fast (sub-minute) reciprocal space mapping (RSM), high-temperature x-ray measurements, grazing incidence small-angle x-ray scattering (GISAXS), topography analysis using diffraction contrast imaging, and analysis of non-basal-plane wurtzite materials. The addition of the proposed system will immediately impact the existing DoDsupported research programs being conducted by the PI and five Other Key Personnel at CHTM in the areas of III-nitride high-speed light-emitting diodes (LEDs), near-UV vertical-cavity surface-emitting lasers (VCSELs), high power vertical external-cavity surface-emitting lasers (VECSELs), multi-junction solar cells, strained nanowire transistors, semiconductor nanomembranes, and carbon nanotube fiber-reinforced polymers. The demographics of the state provide a unique opportunity to strongly impact underrepresented minority groups. Hispanics constitute 46.3% of the population and the state has the second highest Native American population by percentage (9.4%) and the 4th highest by population (193,222). The tool will be incorporated into the CHTM Nanofabrication User Facility and open to a variety of researchers, including visiting high school students, undergraduates, graduate students, visiting researchers and teachers, and faculty across several departments.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Sep 20, 2018
- Source ID
- W911NF1710476
Entities
People
- Daniel Feezell
Organizations
- Army Contracting Command
- Office of the Secretary of Defense
- University of New Mexico