Acquisition of an Advanced Plasma Etching System for Research at Nanoscale for Energy Harvesting and Nanoelectronics at Alabama A&M University
Abstract
Objectives and Methods: The objective of this project is to acquire a state-of-the-art OXFORD PlasmaPro 100 Cobra inductively coupled plasma (ICP) etching system to enable researchers at the Alabama A&M University (AAMU), a leading HBCU, to fabricate devices at the micro- and nanoscales. The capability of fabricating materials and devices at nanoscale is critical not only for the advancement of science and technology, but also for the training of the future scientific workforce. Currently, 10 engineering and science faculty members and more than 30 graduate and undergraduate students rely on the class-1,000 cleanroom as a primary experimental resource for the design and fabrication of nanoscale materials and devices. Three of the key capabilities for nanoscale fabrication are the ability to create patterns using UV or e-beam lithography, the ability to grow nanoscale thin-film materials, and the ability to etch those patterns into a variety of substrates. Our lithographic capability is excellent: (1) a JEOL scanning electron microscope with nanometer pattern generation system for e-beam lithography; (2) A Suss MABA 6 Gen3 mask aligner for UV lithography, which was installed with the DoD/ARO support in 2017. Our thin-film deposition capability is also excellent: (1) physical vapor deposition (PVD) including a sputtering deposition system and a thermal/e-beam evaporation system; (2) chemical vapor deposition (CVD) including a KJL ALD-150LX plasma-enhanced atomic layer deposition (PE-ALD) system, which was installed with the DoD/ARO support in 2018. However, we donÕt have any high-density plasma etch system in our cleanroom, which is critical in the fabrication at nanoscale. The requested plasma etch system is a necessary companion instrument to our clean-room fabrication tools. Through this proposal evidence is provided that acquisition of the etching system would propel nanoscale science and technology at AAMU serving northern Alabama to new frontiers. Impact on Research: Multiple research projects at AAMU require an advanced plasma etching capability. The research areas range from fabrication of energy-conversion materials and devices to nanoelectronic devices. The acquisition of the advanced plasma etching system will make these projects to be completed successfully, and will serve multiple faculty and student users. The research accomplishments will greatly benefit DoD and also the research community. Impact on Education: Acquisition of systems will not only aid advancing multiple research areas, many with applications that directly benefit society, but also enhance educational opportunities for both graduate and undergraduate students. The use of state-of-the-art instruments provides essential training to our majority underrepresented students who will become tomorrowÕs researchers in government, academia, and industries. Undergraduates will be exposed to the exciting and rich possibilities of nanofabrication through the research projects. High school teachers and students will be trained on the instrument. About 90% of the students trained with this instrument will be minority students.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Jun 25, 2021
- Source ID
- W911NF2110195
Entities
People
- Zhigang Xiao
Organizations
- Alabama A & M College
- Army Contracting Command
- Office of the Secretary of Defense