Wafer-Scale Electron-Beam Lithography System For Advanced Nanophotonics Research and Education
Abstract
Funding is requested for the acquisition of a Raith PIONEER Two Ð Ultra high resolution electron beam lithography (EBL) and scanning electron microscope (SEM) imaging system. The tool is intended for large area wafer scale material patterning and synthesis, nanophotonic, optoelectronics, and electronic device processing, nano-scale manufacturing and nanotechnology education and commercialization. The PIONEER Two is a compact yet versatile electron beam system for uncompromised sub-10nm lithography and ultra high resolution imaging - a perfect EBL-SEM-hybrid! It has been specifically designed as a robust and configurable platform for multi-user environments. The PIONEER Two is comprised of an on-board, high-precision, laser-interferometer-controlled stage, which enables state-of-the-art exposures, pattern placement, stitching and overlay performance. An RT-module can be further equipped to enable dedicated sample inspection. The stage also allows highly precise large area image acquisition. The proposed large area electron beam lithography and SEMimaging system can significantly boost research and educational capabilities at UTA, local companies in North Texas, and partner institutes in the region. It can enhance nanophotonics based research for energy efficient photonic and optoelectronic devices, integrated photonics, optical-imaging and sensing. By exploring cavity scaling at nanometer scales, carrier dynamics, laser modulation speed, and energy cost for semiconductor lasers can be investigated for energy efficient integrated photonics. The fabrication of nanoscale structures can also results in hybrid nanophotonic transceivers on silicon platform, high performance integrated photonic elements, quantum and nonlinear photonic systems, integrated microwave photonic chips, cold electron transistors and nanoscale gas sensing systems. This new system can attract more students from under-represented groups into STEM careers. It will provide critical research training in the area of nanophotonics, optoelectronics and electronic materials, devices and systems for undergraduate and graduate students participating on the related research projects. Through interdisciplinary collaborations within campus and across Texas and the nation, the tool will be an integral part of attracting underrepresented minorities to UTA, as well as other area institutes and HBCU partners such as the University of Arkansas at Pine Buff (UAPB). Having such highly trained individuals in the workforce is critical to the economic well-being of the United States in both defense-related and other commercial industries that compete in the global marketplace. Thus the equipment system proposed for purchase here will have direct and positive impact on the research training of both undergraduate and graduate students supported by this project in multi-disciplinary areas that are core of critical importance to DoD.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Jun 25, 2021
- Source ID
- W911NF2110219
Entities
People
- Weidong Zhou
Organizations
- Army Contracting Command
- Office of the Secretary of Defense
- University of Texas at Arlington