Advanced Mask Aligner for High Resolution Photolithography Patterning of Nano/Micro Devices and Material Study
Abstract
The structure/property relationships for metasurface integrated uncooled microbolometers will be investigated, specifically identifying the electromagnetic, thermal, and noise properties of the system as a function of the metasurface geometry and material selection. The goal is to understanding the tradeoffs and potential of the metasurface integrated microbolometer to dramatically improve performance of current technology in terms of achieving disruptively lower voltage noise power spectral density, high detectivity, while introducing spectral/polarization selectivity of the metasurface. This will allow for the resolution of IR radiation beyond just the intensity, adding new tools to improve existing performance, while minimizing cost. SixGeyO1-x-y will be used as the TCR semiconductor because it allows the refractive index as well as the electrical properties to be adjusted. The testbed of the project is to investigate technology capability for multi-spectral imaging applications. Currently, the PI is leading a three-year ARO program entitled ÒMetasurface Integrated Uncooled Silicon Germanium Oxide Microbolometers,Ó W911NF2110072 sponsored by Dr Tania M. Paskova. The proposed mask aligner (MA BA6 Gen4) instrument is capable of patterning small features down to 0.8 µm with high resolution and alignment accuracy of 0.25 µm, excellent uniformity and much better focusing required for the fabrication of the proposed DoD funded research. In addition, the instrument has flexibility in the selection of g-h-I line spectrum. All these features can significantly enhance the quality of this DoD-funded research by enabling the fabrication of nano/micro scale materials and devices including ¥ Combinatorial Fabrication of Metasurface ¥ Metasurface based uncooled microbolometer On the other hand, the proposed Mask Aligner instrument will enhance and propel our other ongoing research to a new frontier in areas of interest to the DoD with the thrusts focused at ¥ Metamaterial based ultrathin tunable terahertz absorbers ¥ Electrowetting Enhanced Dropwise Condensation in the Zero-G Environment ¥ Sensor-integrated 3D tissue scaffold for physiological interrogations The PI loves teaching and is passionate about integrating the state-of-the-art technology into his classes. He trains undergraduate and graduate students to fabricate biosensors in the Microsystem Research LaboratoryÕs cleanroom. The procurement of this mask aligner instrument will produce substantial impacts beyond just his laboratory research, by training and providing post-doctoral fellows, graduate, and undergraduate researchers with hands-on experience in performing nano/microfabrication experiments of materials and devices. The data generated from testing the fabricated materials and devices using this instrument will establish a sound understanding of the structure/property relationships for metasurface integrated uncooled infrared detectors, and will potentially revolutionize the ArmyÕs thermal imaging cameras.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Feb 09, 2023
- Source ID
- W911NF2310055
Entities
People
- Mahmoud Almasri
Organizations
- Army Contracting Command
- United States Army
- University of Missouri