STUDY OF MICROJUNCTION FORMATION TECHNOLOGY
Abstract
An investigation of the experimental method of determining the built- in voltage of abrupt pn junctions by capacitance vs. voltage measurements is given and possible errors are discussed. Preliminary results on the lithographic use of the electron beam for fabricating semiconductor devices are presented. A scaled down plasma torch for semiconductor applications is described. The report closes with a summary and discussion of the electron beam work performed under this contract.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 08, 1962
- Accession Number
- AD0273616
Entities
People
- A. Ramsa
- R. Engelmann