FABRICATION OF GLASS MASKS, AND THEIR APPLICATION TO THIN-FILM CIRCUIT DEPOSITION

Abstract

This report describes a process which has been developed for the etching of glass masks. A discussion of the requirements for these masks in thin-film circuit deposition precedes a detailed description of the process. Six masks were produced by the process, and measurements were made to determine the tolerances obtained.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
May 01, 1965
Accession Number
AD0464486

Entities

People

  • P. Everett
  • R. Roderick

Organizations

  • MITRE Corporation

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Abstracts
  • Acids
  • Air Force
  • Circuits
  • Contracts
  • Corporations
  • Etching
  • Fabrication
  • Films
  • Government Procurement
  • Hydrofluoric Acid
  • Materials
  • Measurement
  • Networks
  • Photography
  • Resistance
  • Thin Films

Fields of Study

  • Materials science

Readers

  • Integrated Circuit Design and Technology.
  • Materials Science and Engineering.
  • Systems Analysis and Design