INFRARED SCATTERING BY SILICON CRYSTALS
Abstract
Incoherent infrared scattering of silicon was reviewed and scattering from a crystal grown along a (110) axis was examined. It was concluded that the incoherent infrared scattering arises from regions in the crystal bounded by dislocation loops. The observed radii of cyration of the scattering regions, approximately 5 microns, agree with the size of dislocation loops which are observed using Dash's decorating technique. Analysis of the small angle scattering precludes the presence of oxide particles smaller than about 1 micron, and microscopic examination discloses no particles larger than this, indicating that there was no coalescence of oxides.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1962
- Accession Number
- AD0482460
Entities
People
- David F. Wagner
Organizations
- Naval Postgraduate School