CHEMICAL VAPOR DEPOSITION OF HAFNIUM CARBIDE

Abstract

Chemical vapor deposition of hafnium carbide yielded whiskers, needles, dendrites, faceted crystals, and adherent coatings. The gas stream compositions and the mass transfer conditions determined the habit of deposit. The deposits were obtained at temperatures ranging from 1100 to 1800 deg C.

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Document Details

Document Type
Technical Report
Publication Date
Oct 25, 1967
Accession Number
AD0661960

Entities

People

  • J. R. Teviotdale
  • R. A. Corley
  • W. R. Wilcox

Organizations

  • The Aerospace Corporation

Tags

Communities of Interest

  • Advanced Electronics
  • Weapons Technologies

DTIC Thesaurus Topics

  • Abstracts
  • Aerospace Industry
  • Air Force
  • Carbides
  • Chemical Vapor Deposition
  • Coatings
  • Composite Materials
  • Crystals
  • Graphitic Materials
  • Mass Transfer
  • Materials
  • Materials Processing
  • Materials Science
  • Melting Point
  • Thermal Insulation
  • Tungsten
  • Vapor Deposition

Readers

  • Powder metallurgy of Titanium alloys.
  • Thin Film Deposition Science.