SCHOTTKY EMISSION IN THIN-FILM DIODES

Abstract

Temperature-dependent current-voltage (I-V) characteristics was observed in a new type of thin-film diode, consisting of Al, Al2O3, Mn, MnxOy, and Pb. Plots of In I-V to the 1/2 power, d In I/dV to the 1/2 power - 1/T, and In(I/sq T) - 1/T (where T is temperature in K) can be fitted by straight lines which show that Schottky emission is the dominant current-flow mechanism over the temperature range of 190K to about 350K. Barrier thicknesses were determined by high-frequency capacitance measurements and found to lie between 100A and 250A. Relative work functions, between the aluminum and lead films, were found to lie between 0.25 and 0.50 ev. One of the diodes was tested at 60 Hertz for 124 hours without causing a significant change in the shape of the I- V characteristic. It is concluded that nominal refinement of the fabrication technique will lead to a varistor thin-film diode which is inexpensive and which has long-term stability.

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Document Details

Document Type
Technical Report
Publication Date
Apr 01, 1968
Accession Number
AD0668694

Entities

People

  • R. D. Hitchcock

Organizations

  • Naval Facilities Engineering Service Center

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Artificial Intelligence
  • Civil Engineering
  • Emission
  • Engineering
  • Films
  • Insensitive Explosives
  • Materials
  • Measurement
  • Regulators
  • Thin Films
  • Voltage Regulators
  • Work Functions

Fields of Study

  • Materials science

Readers

  • Electrical Engineering
  • Materials Science and Engineering.
  • Plasma Physics.