THE PREPARATION OF NiO THIN FILMS FOR USE IN OPTICAL MEASUREMENTS IN THE VISIBLE AND ULTRAVIOLET
Abstract
Several methods for producing nickel oxide films for use in optical experiments are discussed including an indication of the significant problems encountered with each method. Electron reflection diffraction measurements indicate that films grown by electron beam evaporation of nickel in an oxygen atmosphere and by reactive sputtering on CaF2 and LiF have at least some degree of crystalline order. Transmission spectra between 2000 angstroms and 6000 angstroms are presented for films grown by both electron beam evaporation and reactive sputtering. The spectra appear to be consistent with one another as well as with the spectra of epitaxial Ni0 films grown on MgO by vapor deposition. The spectra are, however, at least in some cases, distorted by color centers introduced in the substrate during film deposition. Two films were used to provide information on the shift of the Ni0 absorption edge with temperature, the results being -0.00029 eV/deg. C and -0.00042 eV/deg. C respectively. A Kramers Kronig analysis of the reflectivity of bulk Ni0 was made and shows that the absorption of the films is consistent with the absorption constant derived from the reflectivity data.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 1968
- Accession Number
- AD0682932
Entities
People
- Charles E. Rossi
Organizations
- Harvard University