GaN-Based FETs with Laterally-Gated Multi-2DEG Channels for High Power and Linearity
Abstract
We report on a new type of GaN-based field effect transistors with laterally-gated multiple 2DEG channels, called BRIDGE FET (buried dual gate FET). Unique operation principle of the proposed transistor demonstrated unprecedented device characteristics suitable for efficient and linear millimeter wave power amplifier applications. Multiple 2DEG channels formed in AlGaN/GaN and AlN/GaN material systems are compatible with the BRIDE FET structure, adding design flexibility for an increased drain current density with higher frequency performance. Finally, hexagonal micro-scale device cells consisting of segmented BRIDGE FETs construct a power amplifier (PA) unit cell, where distributing heat sources uniformly over an entire PA cell area maximizes its area power
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 25, 2019
- Accession Number
- AD1075401
Entities
People
- Andrea Arias
- Andrew D. Carter
- Berinder Brar
- Casey King
- Debdeep Jena
- Eric J. Regan
- Huili G. Xing
- Joshua Bergman
- K. Shinohara
- Kazuki Nomoto
- Miguel Urteaga
- Moududul Islam
- Reet Chaudhuri
- Ryan Page
Organizations
- Teledyne Technologies