Radiation Effects in III-V MOSFETs for sub-10 nm CMOS

Abstract

This is the final report of a research program that studied radiation effects in InGaAs- and InGaSb-based MOSFETs for future CMOS technology insertion and to investigate appropriate parametric sensitivity that will be useful in the event that mitigation strategies are required in the future. The goal was to develop basic understanding of the physical phenomena involved by building appropriately tailored test structures and devices and testing them under a variety of radiation conditions that include X-rays, protons, heavy ions, and alpha particles. Emphasis was given to dielectrics and semiconductor structures and geometries of relevance to sub-10 nm CMOS nodes, namely Tri-gate designs.

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Document Details

Document Type
Technical Report
Publication Date
Mar 20, 2020
Accession Number
AD1097669

Entities

People

  • Jesús A. del Alamo
  • Ronald D. Schrimpf

Organizations

  • Massachusetts Institute of Technology

Tags

DTIC Thesaurus Topics

  • Aspect Ratio
  • Bipolar Junction Transistors
  • Compound Semiconductors
  • Dielectrics
  • Dry Etching
  • Fabrication
  • Field Effect Transistors
  • Geometry
  • Manufacturing
  • Metal-Semiconductor Junctions
  • Power Electronics
  • Pulsed Lasers
  • Quantum Wells
  • Radiation Effects
  • Semiconductors
  • Three Dimensional
  • X Rays

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Nuclear and Radiation Engineering.
  • Plasma Physics / Magnetohydrodynamics

Technology Areas

  • Microelectronics