Instructions: Diener Hexamethyldisiloxane (HMDSO) Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Abstract

This report describes the procedure to set up a modified Diener plasma-enhanced chemical vapor deposition system using a liquid hexamethyldisiloxane (HMDSO) precursor. The user, via gas control, determines the chemistry of the deposited thin films. The composition is controllable from approximately 50 atomic percent carbon to less than 1 atomic percent carbon continuously. The control is realized by balancing the ratios of the partial pressures of the input gasses, argon and/or oxygen, with the HMDSO partial pressure. This permits the deposition of polymer thin films to silicon dioxide films with a single nontoxic precursor.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 2020
Accession Number
AD1110600

Entities

People

  • Thomas C. Parker

Organizations

  • United States Army Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Alcohols
  • Base Pressure
  • Chambers
  • Chemical Vapor Deposition
  • Chemistry
  • Films
  • Gas Flow
  • Materials
  • Partial Pressure
  • Precursors
  • Pumping
  • Pumps
  • Silicon Dioxide
  • Thin Films
  • Vacuum
  • Vacuum Chambers
  • Vapor Deposition

Readers

  • Combustion and Flow Dynamics.
  • Thin Film Deposition Science.