DEVCOM Army Research Laboratory Specialty Electronic Materials and Sensors Cleanroom (SEMASC) Dry Etching Capability

Abstract

This report presents the dry-etch capabilities at the US Army Combat Capabilities Development Command Army Research Laboratory Specialty Electronic Materials and Sensors Cleanroom research facility. This encompasses plasma- and gaseous-chemical-reaction-based processes for removing a wide range of materials used by internal and external customers. The currently installed tool base for dry etching as well as the processing capabilities for each tool are discussed.

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Document Details

Document Type
Technical Report
Publication Date
Feb 01, 2021
Accession Number
AD1123272

Entities

People

  • Gerard Dang
  • Nelson Mark

Organizations

  • United States Army

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Abstracts
  • Ceramic Materials
  • Chemical Reactions
  • Chemical Synthesis
  • Chemistry
  • Compound Semiconductors
  • Detectors
  • Dry Etching
  • Electronic Materials
  • Electronics Laboratories
  • Etching
  • Fabrication
  • Field Effect Transistors
  • Films
  • Ion Beams
  • Ions
  • Manufacturing
  • Materials
  • Materials Laboratories
  • Microelectromechanical Systems
  • Military Research
  • Observatories
  • Research Facilities
  • Semiconductors
  • Silicon Carbide
  • Specifications
  • Standards
  • Test Facilities

Readers

  • Enterprise Information Systems Architecture and Joint Command Capability Interoperability Support.
  • Nanofabrication and Microfabrication.
  • Technical Research and Report Writing.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene