Techniques for the Microfabrication of Integrated Optical Waveguide Couplers

Abstract

This report covers the development of an Electron Projection Exposure System (EPES) that uses a large-area electron beam to image an object transmission mask with a size reduction of 20x. The demagnified patterns produced in an electron-sensitive resist are useful for fabricating such devices as integrated optical couplers and switches.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1975
Accession Number
ADA037220

Entities

People

  • E. R. Westerberg

Organizations

  • SRI International

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Computers
  • Contracts
  • Couplings
  • Electron Beam Lithography
  • Electron Beams
  • Fabrication
  • Films
  • High Resolution
  • Lithography
  • Materials
  • Materials Processing
  • Optical Waveguides
  • Photolithography
  • Temperature Gradients
  • Thin Films
  • Waveguide Couplers
  • X Rays

Fields of Study

  • Physics

Readers

  • Image Processing and Computer Vision.
  • Microwave Engineering.
  • Nanofabrication and Microfabrication.

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene