Reliability Study of High Efficiency GaAs IMPATT Devices.
Abstract
The reliability of low-high-low profile gallium arsenide IMPATT diodes has been studied. The devices were fabricated from vapor phase grown epitaxial gallium arsenide using sputtered platinum Schottky junctions and plated heat sink contruction. Various screening methods have been evaluated for use in burn-in, and 75 deg. C case DC burn-in at rated power dissipation selected as the best compromise. Long-term operation tests have established a minimum MTBF at 90% confidence of 41,000 hours. RF storage step stress tests have revealed a potential failure mechanism involving separation of the metallization layers. An improved metallization system has been established eliminating this mechanism. Various additional tests have demonstrated the immunity of these IMPATTs to damage from on-off switching transients, load mismatch and bias voltage transients. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1979
- Accession Number
- ADA067223
Entities
People
- John L. Heaton
Organizations
- M/A-COM Technology Solutions