Submillimeter Schottky Diodes with Electron Beam Lithography.

Abstract

A microprocessor based electron beam lithography system has been developed for production of Schottky barrier diodes with submicron geometric features. The electron beam lithography system is described along with details of the fabrication procedure. Complete logic diagrams and listings of the microprocessor operating software are included. (Author)

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1979
Accession Number
ADA082356

Entities

People

  • G. T. Wrixon
  • John B. Langley Ii

Organizations

  • University College Cork

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Computers
  • Debugging
  • Electron Beam Lithography
  • Electron Microscopes
  • Electron Microscopy
  • Electronics Laboratories
  • Energy
  • Integrated Circuits
  • Operating Systems
  • Scanning Electron Microscopes
  • Scattering
  • Schottky Diodes
  • Semiconductor Devices
  • Semiconductors
  • Service Modules
  • Solid State Electronics
  • Standards

Fields of Study

  • Physics

Readers

  • Computer Engineering
  • Electronics Engineering
  • Nanofabrication and Microfabrication.

Technology Areas

  • Directed Energy
  • Microelectronics