Stress in Porous Thin Films through Adsorption of Polar Molecules

Abstract

Films of magnesium fluoride are found to be under large tensile stress following exposure to water vapour. It is shown that this stress, which varies reversibly in magnitude with the adsorption equilibrium, can be attributed to electrostatic dipole interaction between the adsorbed water molecules. The effect is not confined to magnesium fluoride, but can occur in other materials of an appropriate porous structure. Its relevance to the stability of optical coatings is discussed, together with some other applications.

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Document Details

Document Type
Technical Report
Publication Date
Mar 01, 1980
Accession Number
ADA087770

Entities

People

  • E. H. Hirsch

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Adsorption
  • Buildings And Structures
  • Coatings
  • Department Of Defense
  • Electronics
  • Films
  • Fluorides
  • Magnesium
  • Materials
  • Materials Laboratories
  • Molecules
  • Optical Coatings
  • Stresses
  • Tensile Stress
  • Thin Films

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Mechanical Engineering/Mechanics of Materials.