Development of High Performance Sintered Si3N4
Abstract
a gas pressure sintering (GPS) process has been developed to produce Si3N4, containing 0.5-1.0 wt% Be and 2.5-3.7 wt% O, with > 99% relative density. The modulus of rupture of GPS Si3N4 at 1300 degrees was 553 MNm to the minus 2 power (80,200 psi), representing 93% of its room temperature strength. The creep and oxidation resistances were outstanding and evidenced by creep rates of 4.6 x 10 to the minus 7 power and 6.9 x 10 to the minus 6 power N to the minus 1 power at a stress of 69 MNm to the minus 2 power (10,000 psi) at 1300 and 1400 degrees C in air.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 1980
- Accession Number
- ADA091757
Entities
People
- C. D. Greskovich
- J. A. Palm
Organizations
- General Electric