High Resistivity Molecular Beam Epitaxial AlGaAs for Device Applications.
Abstract
High resistivity epitaxial layers of AlxGa1-xAs have been produced by molecular beam epitaxy. These layers have been incorporated, as a buffer layer, in the fabrication of GaAs MESFETs and the results are discussed. Device analysis includes an assortment of low frequency and DC measurements as well as RF measurements. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- May 01, 1981
- Accession Number
- ADA107597
Entities
People
- D. L. Miller
- D. R. Ch'en
- W. A. Hill