Holographic Optical Elements with Ultra-High Spatial Frequencies.
Abstract
This dissertation describes an experimental study of optical elements with ultra-high spatial-frequency surface corrugations in both photoresist and quartz. Details of element fabrication are given and two new applications are suggested. For the photoresist gratings, angular selectivity, wavelength selectivity, and peak efficiency are investigated. The study shows that optical elements with spatial frequencies in excess of 3000 l/mm and efficiencies greater than 88% can be recorded in subwavelength thick layers of Shipley AZ-1300 series photoresist. The quartz elements are made via reactive ion etching which faithfully transfers a pattern from a photoresist mask to a fused quartz substrate. The quartz gratings have withstood laser fluxes of 4.17 GW/cm2 without sustaining damage and have efficiencies greater than 85%. Two new applications for substrates with ultra-high spatial-frequency surface corrugations are reported. Such elements at normal incidence are antireflective (AR) with broadband reflection coefficients less than 0.045%. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1983
- Accession Number
- ADA132355
Entities
People
- Rolf Charles Enger
Organizations
- Air Force Institute of Technology