Ultrahigh Resolution Ion Beam Processes

Abstract

This is the first semiannual progress report on the program 'Ultra- high Resolution Ion Beam Processes.' The overall goal of the program is to establish the technical and economic feasibility of applying submicrometer diameter focused ion beams to microcircuit fabrication without the use of masks. The progress for this reporting period consists of obtaining and operating two high brightness ion sources, analyzing focusing lenses and columns, and designing and fabricating a focusing column for each ion source. These columns are now about 80% complete and it is expected that one will be put into operation during the next quarter. Keywords include: Ion Beam, Sputtering, Focusing Column, and Einzel Lens.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1976
Accession Number
ADA155749

Entities

People

  • D. Hunken
  • J. W. Ward
  • R. L. Seliger

Organizations

  • HRL Laboratories

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Assembly
  • Brightness
  • Computer Programs
  • Computers
  • Electron Beams
  • Electron Microscopes
  • Electron Microscopy
  • Fabrication
  • Field Emission
  • High Voltage
  • Ion Beams
  • Ion Sources
  • Liquid Metals
  • Literature Surveys
  • Microscopes
  • Scanning Electron Microscopes
  • Test And Evaluation

Fields of Study

  • Physics

Readers

  • Electronics Engineering
  • Technical Research and Report Writing.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics