Flash Photolysis of Aromatic Diisocyanate Based Polyurethanes.

Abstract

The laser flash photolysis of aromatic diisocyanate based polyurethanes in solution provides evidence for a dual mechanism for photodegradation. One of the processes, an N-C bond cleavage, is common to both TDI (toluene diisocyanate) and MDI (methylene 4,4' -diphenyldiisocyanate) based polyurethanes. The second process, exclusive to MDI based polyurethanes, involves formation of a substituted diphenylmethyl radical. The diphenylmethyl radical, which readily reacts with oxygen, is generated either by direct excitation (248 nm) or by reaction with a tert-butoxy radical produced upon excitation of tert-butyl peroxide at 351 nm.

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Document Details

Document Type
Technical Report
Publication Date
Mar 10, 1988
Accession Number
ADA192278

Entities

People

  • C. E. Hoyle
  • Y. G. No

Organizations

  • University of Southern Mississippi

Tags

Communities of Interest

  • C4I
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Absorption
  • Absorption Spectra
  • Abstracts
  • Anilines
  • Classification
  • Elements
  • Materials
  • Military Research
  • Mississippi
  • Monitoring
  • Photolysis
  • Polymers
  • Polyurethanes
  • Radiation Effects
  • Security
  • United States
  • Universities

Fields of Study

  • Chemistry

Readers

  • Organic Chemistry
  • Polymer Science and Engineering.

Technology Areas

  • Directed Energy