Lower Limits on the Absolute Dissociative Electron Attachment Cross Section from O2 Condensed on Rare-Gas Films

Abstract

The approach for experimentally obtaining a lower limit on the absolute cross section for production of O(-) by dissociative electron attachment from O2 condensed on a Kr film is summarized here. Comparison of this result with the dissociative attachment cross section for gas phase O2 reveals a factor of 17 enhancement on the surface. It is semiquantitatively shown that a decreased autoionization rate, arising from the electronic polarization of the neighboring Kr atoms, can account for most of this large enhancement. (jhd)

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1989
Accession Number
ADA216727

Entities

People

  • David E. Ramaker
  • H. Sambe
  • L. Sanche
  • M. Deschenes

Organizations

  • George Washington University

Tags

DTIC Thesaurus Topics

  • Attachment
  • Electrons
  • Plastic Explosives
  • Polarization
  • Production

Fields of Study

  • Physics

Readers

  • Molecular Photonics/Laser Physics

Technology Areas

  • Microelectronics