Laser Processing of Silicon On Sapphire (SOS) for Fabrication of Bipolar Transistors
Abstract
Nanosecond thermal processing using an excimer laser was used in fabrication of NPN bipolar transistors in silicon-on-sapphire (SOS). Functional devices with current gain approaching 100 were obtained. The deleterious effects of diffusion pipes in SOS material were minimized using rapid laser activation of in implanted dopant. Details of the device design fabrication, and test results are included in this report.
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 01, 1990
- Accession Number
- ADA233390
Entities
People
- B. W. Offord
- K. H. Weiner
- S. D. Russell