Microlithographic Mask Development (MMD).
Abstract
This document, Contractor Progress, Status, Management Report, is submitted in accordance with CDRL DOO4 under contract NOOO19-94-C-0035 and covers the period 23 December 1993 through 23 December 1994. Monthly Contractor Progress, Status, Management Reports have been submitted in accordance with CDRL D004. These reports have provided significant technical detail and insight into accomplishments and problems encountered during the past twelve months. This report does not cover the same information to the level of detail reported monthly but does review highlights, accomplishments and technology issues. Engineering emphasis during this first year of the Microlithographic Mask Development (MMD) program was focused -on establishing the manufacturing capability to fabricate prototype X-ray masks (XRM) and prototype phase shift masks (PSM) for delivery and use by the advanced lithography community. This activity included not only the technical aspects of mask manufacturing such as process optimization, tool procurement and technology acquisition, but also involved the logistics and control systems required in a manufacturing environment, developing the technical plans to meet industry lithography requirements, establishing the support infrastructure for the mask technology, and establishing the business processes required to become a commercially viable enterprise. During the first year of the MMD program, significant progress has been realized in all areas. At the same time, many extremely challenging technical issues have been identified and are being addressed as the X-ray and phase shift mask technologies are made ready for production. Progress and issues are addressed by task in this report.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 23, 1995
- Accession Number
- ADA294391