Microlithographic Mask Development (MMD).

Abstract

Engineering emphasis during this first year of the Microlithographic Mask Development (MMD) program was focused on establishing the manufacturing capability to fabricate prototype X-ray masks (XRM) and prototype phase shift masks (PSM) for delivery and use by the advanced lithography community. This activity included not only the technical aspects of mask manufacturing such as process optimization, tool procurement and technology acquisition, but also involved the logistics and control systems required in a manufacturing environment, developing the technical plans to meet industry lithography requirements, establishing the support infrastructure for the mask technology, and establishing the business processes required to become a commercially viable enterprise. (MM)

Open PDF

Document Details

Document Type
Technical Report
Publication Date
May 23, 1995
Accession Number
ADA294725

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Accuracy
  • Acquisition
  • Ceramic Materials
  • Chemistry
  • Compound Semiconductors
  • Contracts
  • Control Systems
  • Engineering
  • Fabrication
  • Materials
  • Measurement
  • Phase Shift
  • Semiconductors
  • Silicon Carbide
  • Standards
  • Test Vehicles
  • X Rays

Fields of Study

  • Physics

Readers

  • Defense Acquisition Program Management
  • Manufacturing Engineering.
  • Materials Science