Novel Large Area, High Throughput, High Resolution Patterning System Program. Program Study.
Abstract
The objective of this phase is program is to demonstrate a concept for a high resolution ultra violet (UV) based optical patterning system technology for production of both electronic and electro-optical multichip modules (MOMS) and flat panel displays. The tasks identify patterning system requirements, investigate different optical and mechanical design options, perform comparative analysis of design options, procure hardware, demonstrate large area patterning, procure masks, conduct via etching experiments, perform cost study, and determine limits of the system. A proof-of-concept patterning system was assembled. It was used to demonstrate large area seamless patterning using multiple, partially overlapping scans. For patterning resists, the system demonstrated good resolution down to 3 um. For ablation of polyimide, vias showed excellent resolution down to 10 um. Ablation of 6 um wide lines and spaces was demonstrated.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 01, 1995
- Accession Number
- ADA304784
Entities
People
- Greg Lievan
- Kanti Jain
Organizations
- Texas Instruments