AlGaN Channel Transistors for Power Management and Distribution.
Abstract
This report summarizes the first month on the SBIR Phase I program to develop AlGaN Channel JFETs. A mask set to fabricate nitride based JFETs was begun. IV curves of GaN PN junctions are shown. Measurements of the leakage of these junctions indicate that recessing the P layer routinely will require an etch stop to minimize the leakage current. Ni Au P type ohmics did not withstand 500 C anneals.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 05, 1996
- Accession Number
- ADA312620
Entities
People
- James Van Hove