Vapor Deposition Equipment and Thin Film Processing.

Abstract

Work under the contract has provided a vapor deposition facility for the generation of thin films and film structures (devices) for structural and electronic applications. Efforts have been expanded into the actual deposition of films in the systems AlN, (Al,B)N, c-BN (cubic boron nitride) and Si-Al-O-N. We report on the resultant physical, chemical, materials and electronic properties and surface characteristics of the films. In certain cases multilayer film structures have been characterized as well. Device application include high thermal conductivity electronic substrates, device coatings, energy storage capacitor structures, electron emission surfaces (cold cathodes) and low-wear high-strength materials.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1996
Accession Number
ADA321245

Entities

People

  • H. Niculescu
  • M. Tu
  • N. Bai
  • P. J. Gielisse
  • Yan Xu

Organizations

  • Florida A&M University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Ceramic Materials
  • Chemical Vapor Deposition
  • Chemistry
  • Coatings
  • Deposition (Materials Processing)
  • Electron Emission
  • Energy Storage
  • Materials
  • Materials Processing
  • Measurement
  • Mechanical Properties
  • Photoexcitation
  • Physical Properties
  • Scattering
  • Thermal Conductivity
  • Thin Films
  • Vapor Deposition

Fields of Study

  • Materials science

Readers

  • Integrated Circuit Design and Technology.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene