Microlithographic Mask Development (MMD).
Abstract
During this reporting period, manufacturing focus has been on both building gold customer masks and developing the refractory mask process. Ongoing research projects are shown in Table 1 and Table 2. Completed projects are highlighted in the tables. Table 1 provides a concise, aggressive schedule to meet tighter specifications for x-ray mask performance. Each column lists by quarter the specifications for product and the beginning of projects to meet the improvements. Table 2 contains MMD objectives for the refractory metal process. The technology path by quarter comprises the goals and the learning initiated by quarter that must be met to reach these goals for the year. The learning activities are dependent upon each other. This report focuses in detail on the status of these activities.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 14, 1997
- Accession Number
- ADA323980
Entities
People
- S. G. Schnur
Organizations
- Lockheed Martin