Epitaxial Liftoff for Fully Single-Crystal Ferroelectric Thin Films

Abstract

During the period covered by this report we initiated the application of crystal ion slicing to single crystal potassium tantalate and strontium titanate. Transport of ions in matter (TRIM) simulations and ion implantation at 3.8MeV and various dosages were done and removal of the sacrificial layer tested in a number of etchants. Potassium tantalate films have been fabricated and characterized, Sacrificial layer etching studies in SrTiO3 for (110) crystals were also carried out.

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Document Details

Document Type
Technical Report
Publication Date
Jun 29, 1999
Accession Number
ADA365343

Entities

People

  • M. Levy
  • Richard M. Osgood, Jr.

Organizations

  • Columbia University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Bulk Materials
  • Crystals
  • Dielectric Permittivity
  • Electrical Properties
  • Films
  • Heat Treatment
  • Implantation
  • Ion Implantation
  • Ions
  • Materials
  • Military Research
  • New York
  • Phase Transformations
  • Potassium
  • Single Crystals
  • Tantalates
  • Thin Films

Readers

  • Materials Science and Engineering.
  • Software Engineering
  • Thin Film Deposition Science.