Modeling and Control for Rapid Thermally Driven Deposition Processes.

Abstract

The objectives of this program were the study of the chemistry of YBCO thin film deposition by MOCVD, and the model-based control of MOCVD reactors. Model reduction techniques were applied to chemical vapor deposition (CVD) of YBCO thin films. This work has paralleled some of the work of Goodwin et al at Caltech sponsored under the DARPA VIP Phase I program, but with significantly different approach and emphasis. Under this program, the above chemistry was investigated from first principles using quantum chemistry computations (led by MIT). The kinetic and thermodynamic information obtained from these studies were used to generate a kinetic mechanism, which was then coupled to transport models for fluid flow, heat and mass transfer in CVD reactors. These coupled reaction-transport models were used to derive reduced order models for process control.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1999
Accession Number
ADA367507

Entities

People

  • Abbas Emami-naeini
  • Klavs F. Jensen
  • Sarbajit Ghosal
  • Vijay Gupta

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Birds
  • Chemical Reactions
  • Chemical Vapor Deposition
  • Chemistry
  • Computational Fluid Dynamics
  • Control Systems
  • Density Functional Theory
  • Films
  • First Principles Calculations
  • Fluid Flow
  • Heat Transfer
  • Materials
  • Physical Chemistry
  • Quantum Chemistry
  • Thin Films
  • Two Dimensional
  • Vapor Deposition

Fields of Study

  • Chemistry

Readers

  • Computational Fluid Dynamics (CFD)
  • Materials Science and Engineering.
  • Superconducting Magnet Technology

Technology Areas

  • Quantum Computing