Selected Area Epitaxy Applied to Optical Cross Point Switch Technology

Abstract

A program of research to develop technology for WDM switching technology is described. The initial approach was to involve the use of selective area epitaxy to fabricate an amplifier based monolithic switching platform. Significant progress was made towards that goal. During the course of the program, however, an opportunity to exploit new approaches with improved characteristics was conceived and the program goals shifted in that direction. The research involves the exploration of heterogeneous integration techniques for the realization of microresonator-based switches. The basic technology approach was demonstrated in passive microresonator filters and then applied to the demonstration of an active switch. High contrast (> 10:1) switches were demonstrated. A path to the creation of VLSI WDM photonic switch fabricated was demonstrated.

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Document Details

Document Type
Technical Report
Publication Date
Nov 16, 2001
Accession Number
ADA406407

Entities

People

  • Paul Daniel Dapkus

Organizations

  • University of Southern California

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Antireflection Coatings
  • Communication Systems
  • Electronics Laboratories
  • Integrated Circuits
  • Laser Diodes
  • Materials Science
  • Multiple Access
  • Optics
  • Photolithography
  • Photonic Integrated Circuits
  • Quantum Wells
  • Refractive Index
  • Semiconductor Lasers
  • Semiconductors
  • Standing Waves
  • Three Dimensional
  • Two Dimensional

Readers

  • Integrated Circuit Design and Technology.
  • Optical Physics and Photonics.