A Molecular Beam Deposition of DNA Nanometer Films
Abstract
The development of novel photonic devices which incorporate biological materials is strongly tied to the development of thin film forming processes. Solution-based ("wet") processes when used with biomaterials in device fabrication suffer from dissolution of underlying layers, incompatibility with clean environment, inconsistent film properties, etc. We have investigated ultra-high-vacuum molecular beam deposition of surfactant-modified deoxyribonucleic acid (DNA). We have obtained effective deposition rates of 0.1-1 A/s, enabling reproducible and controllable deposition of nanometer-scale films.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 2007
- Accession Number
- ADA497777
Entities
People
- Andrew Steckl
- Hans Spaeth
- James G. Grote
- Joshua A Hagen
- Wei-xin Li
Organizations
- University of Cincinnati