Characterization of Metal/Dielectric Multilayers with in-situ Ellipsometry
Abstract
In this project, metal/dielectric multilayer structures and their applications as hyperlenses for sub-wavelength imaging with resolution beyond diffraction limit were simulated and optimized. Fabrication and characterization of dielectric films with in-situ ellipsometry monitoring the thickness and optical constants has been started. Three dimensional imaging hyperlens with resolution of about 75 nm has been demonstrated numerically.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 04, 2011
- Accession Number
- ADA538171
Entities
People
- Dao Hua Zhang
Organizations
- Nanyang Technological University