Micromachined Resonators of High Q-factor Based on Atomic Layer Deposited Alumina
Abstract
In this paper, atomic layer deposited (ALD) alumina (Al2O3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of chromium (Cr) coated ALD Al2O3 was used as a resonator. The resonatorwas formed by simplewet- and dry-etching processes. The static displacement profile of the micro-resonator under electrostatic load was measured by an optical interferometer. A model of a pinned?pinned beam with axial stress of 250MPa was used to fit the measured data. Two techniques based on scanning electron microscope (SEM) and atomic force microscope (AFM) were developed to characterize the resonant frequencies of different modes and quality factor of the resonator. The measured resonant frequencies matchwell with the calculated values with residual stress of 258MPa, providing additional insight into resonator model and ALD alumina material properties. The developed techniques can be applied to further size reduction of devices made with ALD methods.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 2009
- Accession Number
- ADA553638
Entities
People
- Atif Imtiaz
- Charles T. Rogers
- Dragos Seghete
- Jason M. Gray
- Pavel Kaboš
- Steven M. George
- T. M. Wallis
- Victor M. Bright
- Yuan-jeng Chang
Organizations
- University of Colorado Boulder