Annealing of Multivacancy Defects in 4H-SiC

Abstract

The annealing behavior of defects observed in electron paramagnetic resonance (EPR) and photoluminescence (PL) is discussed. We consider the divacancy (the P6/P7 EPR centers) and a previously unreported EPR center that we suggest is a VC-VSi-VC trivacancy and their relationship with each other and with the UD1 3 series of PL lines near 1 eV. We observe that the divacancy and the UD2 PL lines annealing behavior is strongly correlated further establishing the relationship between the EPR and PL centers. We present a detailed discussion of this center and its (expn 29)Si and (expn13)C hyperfine spectra which supports our assignment as a trivacancy. The intensity of this center increases with annealing temperature as the divacancy decreases and there is a sample-to-sample correspondence between the overall intensities of the two centers. However, the details of their annealing suggest a more complex relationship than a simple one-to-one transformation. In addition, while the UD1 PL increases with annealing temperature, sample-to-sample variations indicate it is not related to this EPR center.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 2006
Accession Number
ADA593663

Entities

People

  • Evan R. Glaser
  • M. A. Fanton
  • N. Y. Garces
  • W. E. Carlos

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms
  • Space

DTIC Thesaurus Topics

  • Annealing
  • Atomic Structure
  • Atoms
  • Electro-Optics
  • Electron Paramagnetic Resonance
  • Electrons
  • Ground State
  • High Temperature
  • Magnetic Fields
  • Materials
  • Measurement
  • Paramagnetic Resonance
  • Quantum Properties
  • Resonance
  • Silicon Carbide
  • Spectra
  • Wave Functions

Readers

  • Materials Science and Engineering.

Technology Areas

  • Microelectronics