Metamorphic InAsSb/AlInAsSb Heterostructures for Optoelectronic Applications
Abstract
Metamorphic heterostructures containing bulk InAs(1-x)Sbx layers and AlInAsSb barriers were grown on GaSb substrates. The lattice mismatch (up to 2.1%) between the GaSb substrates and the InAsSb layers was accommodated by the growth of GaInSb linearly graded buffers. The 1 micrometers thick InAsSb(0.44) layer with an absorption edge above 9 micrometer exhibited an in-plane residual strain of about 0.08%. InAs(1-x)Sbx structures with x=0.2 and x=0.44 operated as light emitting diodes at 80K demonstrated output powers of 90 muW and 8 muW at 5 micrometer and 8 micrometer, respectively
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 20, 2013
- Accession Number
- ADA596687
Entities
People
- David Westerfeld
- Ding Wang
- Dmitry Donetsky
- G. Kipshidze
- Gregory Belenky
- L. Shterengas
- Stefan P. Svensson
- Wendy L. Sarney
- Youxi Lin
Organizations
- State University of New York