Chemical Vapor Deposition of Atomically-Thin Molybdenum Disulfide (MoS2)

Abstract

A method of synthesizing monolayers of molybdenum disulfide (MoS2) via chemical vapor deposition is described. In this process a tube furnace is used to evaporate MoS2 over silicon/silicon dioxide substrates. Sulfur is then evaporated and flown over the substrates via a stream of inert gas. Optical and scanning electron microscopy and Raman spectroscopy are utilized to characterize the growth of the MoS2 monolayers. Density-functional theory simulations are used to compare theoretical predictions to the observed photoluminescence

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Document Details

Document Type
Technical Report
Publication Date
Mar 01, 2015
Accession Number
ADA613852

Entities

People

  • Daniel Kaplan
  • Kendall Mills
  • Venkataraman Swaminathan

Organizations

  • United States Army Armament Research, Development and Engineering Center

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Band Structures
  • Chemical Vapor Deposition
  • Chemistry
  • Crystals
  • Field Effect Transistors
  • Materials
  • Materials Processing
  • Materials Science
  • Metals
  • Molybdenum
  • Raman Spectroscopy
  • Simulations
  • Spectroscopy
  • Transition Metals
  • Two Dimensional
  • Two-Dimensional Materials
  • Vapor Deposition

Fields of Study

  • Materials science
  • Physics

Readers

  • Nanocomposite Materials Science
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene