Maskless Direct-Write Nanolithography for Defense Applications
Abstract
The Maskless Direct-Write Nanolithography for Defense Applications program developed a maskless, direct-write lithography tool that addresses both DoD needs for affordable, high performance, Integrated Circuits (ICs) in small lots and the commercial market's need for highly customized, application-specific ICs. In addition, this program has provided a cost effective manufacturing technology for low volume nanoelectromechanical system (NEMS) and nanophotonic devices within the DoD. Transition will be achieved by installing maskless lithography tools into the Trusted Foundry and in commercial foundries, which will enable affordable incorporation of state-of-the-art semiconductor devices in new military systems, and allow for the cost-effective upgrade of legacy military systems.
Document Details
- Document Type
- Accomplishment
- Publication Date
- Oct 01, 2015
- Source ID
- ef668e2e33e5892d43ec346105bfa3fd